Fabrication and characterization of ultra-thin NbN hot electron bolometer for near infrared single photon detection

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 520, Issue 1-3, 2004, Pages 541-543

  Delaet, Bertrand ^a,b   Villegier, Jean Claude ^b   Escoffier, Walter ^b   Thomassin, Jean Luc ^b   Feautrier, Philippe ^a   Wang, Irène ^c   Renaud Goud, Philippe ^c   Poizat, Jean Philippe ^c  

^a LABORATOIRE D ASTROPHYSIQUE   (France)

^b CEA GRENOBLE   (France)

^c LIPHY   (France)

Author keywords

E beam lithography; NbN epitaxy; Near infrared; Single photon detector; Thin film fabrication

Indexed keywords

ASTRONOMY; ELECTRON BEAM LITHOGRAPHY; EPITAXIAL GROWTH; ETCHING; NIOBIUM COMPOUNDS; PHOTONS; QUANTUM EFFICIENCY; QUANTUM OPTICS; SAPPHIRE; SUPERCONDUCTING MATERIALS; THIN FILMS;

NBN EPITAXY; NEAR INFRARED; SINGLE PHOTON DETECTORS; THIN FILM FABRICATION;

BOLOMETERS;

EID: 1642587684     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nima.2003.11.309     Document Type: Conference Paper

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