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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 2, 2002, Pages 379-387

Ionized physical vapor deposition of titanium nitride: Plasma and film characterization

(3) Mao, D a Tao, K a Hopwood, J a

a NORTHEASTERN UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; DISSOCIATION; EMISSION SPECTROSCOPY; FLUXES; INDUCTIVELY COUPLED PLASMA; IONIZATION; METALLIC FILMS; MOLECULAR VIBRATIONS; PHYSICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

IONIZED PHYSICAL VAPOR DEPOSITION (IPVD);

TITANIUM NITRIDE;

EID: 0036494508 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1446448 Document Type: Article

Times cited : (39)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.