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Thin Solid Films

Volumn 469-470, Issue SPEC. ISS., 2004, Pages 295-303

Production of AlN films: Ion nitriding versus PVD coating

(3) Figueroa, U a Salas, O a Oseguera, J a

a SCHOOL OF ENGINEERING AND SCIENCES (Mexico)

Author keywords

Aluminum ion nitriding; Aluminum nitride; Aluminum reactive magnetron Sputtering

Indexed keywords

ELECTRIC PROPERTIES; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MIXTURES; MORPHOLOGY; NITRIDING; OPTICAL PROPERTIES; PHYSICAL VAPOR DEPOSITION; PLASMA APPLICATIONS; THIN FILMS; TRIBOLOGY; X RAY DIFFRACTION ANALYSIS;

ALUMINUM ION NITRIDING; ALUMINUM REACTIVE MAGNETRON SPUTTERING; PLASMA ASSISTED NITRIDING (PAN);

ALUMINUM NITRIDE;

EID: 10044231630 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2004.08.129 Document Type: Article

Times cited : (20)

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