Microscopic investigations of aluminum nitride thin films grown by low-temperature reactive sputtering

Thin Solid Films

Volumn 483, Issue 1-2, 2005, Pages 16-20

  Guo, Q X ^a   Yoshitugu, M ^a   Tanaka, T ^a   Nishio, M ^a   Ogawa, H ^a  

^a SAGA UNIVERSITY   (Japan)

Author keywords

Aluminum nitride; Atomic force microscopy; Low temperature growth; Surface roughness

Indexed keywords

ACOUSTIC SURFACE WAVE DEVICES; ALUMINUM NITRIDE; CONCENTRATION (PROCESS); FILM GROWTH; LOW TEMPERATURE EFFECTS; MICROSCOPIC EXAMINATION; NITROGEN; SPUTTERING; SURFACE ROUGHNESS; THERMAL EFFECTS;

ALUMINUM TARGET; ATOMIC-FORCE MICROSCOPY; GROWTH TEMPERATURE; LOW-TEMPERATURE GROWTH;

THIN FILMS;

EID: 18844400282     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.12.014     Document Type: Article

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