Highly crystallized silicon films grown on glass without amorphous incubation layers by inductively coupled plasma chemical vapor deposition

Journal of Crystal Growth

Volumn 310, Issue 19, 2008, Pages 4340-4344

  Li, Junshuai ^a,b   Wang, Jinxiao ^a   Yin, Min ^a   Gao, Pingqi ^a   Chen, Qiang ^b   Li, Yali ^b   He, Deyan ^a  

^a LANZHOU UNIVERSITY   (China)

^b SAITAMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; GLASS; INDUCTIVELY COUPLED PLASMA; METALLIC FILMS; PHOTORESISTS; PLASMA DEPOSITION; PLASMAS; SILICON; VAPORS;

INCUBATION LAYERS; INDUCTIVELY COUPLED PLASMA CHEMICAL VAPOR DEPOSITION; SILICON FILMS;

AMORPHOUS FILMS;

EID: 51649093713     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.07.052     Document Type: Article

References (42)

1. Jang J., Oh J., Kim S., Choi Y., Yoon S., and Kim C. Nature 395 (1998) 481
2. Shah A., Torres P., Tscharner R., Wyrsch N., and Keppner H. Science 285 (1999) 692
3. Bergmann R.B. Appl. Phys. A 69 (1999) 187
4. Fujiwara H., Kondo M., and Mastuda A. J. Appl. Phys. 93 (2003) 2400
5. Saha S.C., Rath J.K., Kshirsagar S.T., and Ray S. J. Phys. D 30 (1997) 2686
6. Huang R., Lin X.Y., Yu Y.P., Lin K.X., Zhu Z.S., Wei J.H., and Chen K.J. J. Phys. D 39 (2006) 4423
7. Gordijn A., Hodakova L., Rath J.K., and Schropp R.E.I. J. Non-Cryst. Solids 352 (2006) 1868
8. Rath J.K., Meiling H., and Schropp R.E.I. Jpn. J. Appl. Phys. (Part I) 36 (1997) 5436
9. Jang J., and Lim K. Jpn. J. Appl. Phys. (Part I) 35 (1996) 5625
10. Rath J.K., Franken R.H.J., Gordijn A., Schropp R.E.I., and Goedheer W.J. J. Non-Cryst. Solids 338 (2004) 56
11. Takashima S., Hori M., Goto T., and Yoneda K. J. Appl. Phys. 89 (2001) 4727
12. Hao H., Liao X., Zeng X., Diao H., Xu Y., and Kong G. J. Crystal Growth 281 (2005) 344
13. Bae S., Kalkan A., Cheng S., and Fonash S. J. Vac. Sci. Technol. A 16 (1998) 1912
14. Shin J., and Huh H. J. Vac. Sci. Technol. A 18 (2000) 51
15. Jia H., Shirai H., and Kondo M. J. Appl. Phys. 101 (2007) 114912
16. Matsuda A. Thin Solid Films 337 (1999) 1
17. Matsuda A. J. Non-Cryst. Solids 59 and 60 (1983) 767
18. Tsai C.C., Anderson G.B., Thompson R., and Wacker B. J. Non-Cryst. Solids 114 (1989) 151
19. Layadi N., Cabarrocas P.R.I., Drevillon B., and Solomon I. Phys. Rev. B 52 (1995) 5136
20. Boland J.J., and Parsons G.N. Science 256 (1992) 1304
21. Nakamura K., Yoshino K., Takeoka S., and Shimizu I. Jpn. J. Appl. Phys. (Part I) 34 (1995) 442
22. Sriraman S., Agarwal S., Aydil E.S., and Maroudas D. Nature 418 (2002) 62
23. Rath J.K. Sol. Energy Mater. Sol. Cells 76 (2003) 431
24. Li J., Wang J., Yin M., Gao P., He D., Chen Q., Li Y., and Shirai H. J. Crystal Growth 308 (2007) 330
25. Zhou J., Ikuta K., Yasuda T., Umeda T., Yamasaki S., and Tanaka K. Appl. Phys. Lett. 71 (1997) 1534
26. Heya A., Izumi A., Matsuda A., and Matsumura H. Jpn. J. Appl. Phys. (Part I) 39 (2000) 3888
27. Moon B., Youn J., Won S., and Jang J. Sol. Energy Mater. Sol. Cells 69 (2001) 139
28. Mani R.C., Pavel I., and Aydil E.S. J. Appl. Lett. 102 (2007) 043305
29. Li J., Wang J., Yin M., Gao P., He D., Chen Q., Li Y., and Shirai H. J. Appl. Phys. 103 (2008) 043505
30. Sugai H., Nakamura K., and Suzuki K. Jpn. J. Appl. Phys. (Part I) 33 (1994) 2189
31. In: Klug P., and Alexander L.E. (Eds). X-Ray Diffraction Procedures for Polycrystalline and Amorphous Materials. second ed. (1974), Wiley, New York 687-780
32. Guo L., Kondo M., Fukawa M., Saitoh K., and Matsuda A. Jpn. J. Appl. Phys. (Part II) 37 (1998) L1116
33. Campbell H., and Fauchet P.M. Solid State Commun. 58 (1986) 739
34. Richter H., Wang Z., and Ley L. Solid State Commun. 39 (1981) 625
35. Collins R.W. Appl. Phys. Lett. 48 (1986) 843
36. Kumar S., Drevillon B., and Godet C. J. Appl. Phys. 60 (1986) 1542
37. Jellison G.E., Chisholm M.F., and Gorbatkin S.M. Appl. Phys. Lett. 62 (1993) 3348
38. Fujiwara H., Kondo M., and Mastuda A. J. Appl. Phys. 91 (2002) 4181
39. Perrin J., and Broekhuizen T. Appl. Phys. Lett. 50 (1987) 433
40. Matsuda A. Jpn. J. Appl. Phys. 43 (2004) 7909
41. Guizot J.L., Nomoto K., and Matsuda A. Surf. Sci. 244 (1991) 22
42. Shimizu S., Kondo M., and Matsuda A. J. Appl. Phys. 97 (2005) 033522