Control of polycrystalline silicon structure by the two-step deposition method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 7 A, 2000, Pages 3888-3895

  Heya, Akira ^a   Izumi, Akira ^a   Masuda, Atsushi ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Amorphous silicon; Catalytic chemical vapor deposition; Grain size; Hot wire chemical vapor deposition; Incubation layer; Microcrystalline silicon; Nucleation; Polycrystalline silicon; Surface morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; FILM PREPARATION; GRAIN SIZE AND SHAPE; MORPHOLOGY; RAMAN SPECTROSCOPY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING FILMS; SURFACES; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

CATALYTIC CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE SILICON STRUCTURE; STRUCTURAL PROPERTIES; TWO STEP DEPOSITION METHOD;

POLYCRYSTALLINE MATERIALS;

EID: 0034215441     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.3888     Document Type: Article

References (15)

1. H. Matsumura and H. Tachibana: Appl. Phys. Lett. 47 (1985) 833.
2. H. Matsumura: J. Appl. Phys. 66 (1989) 3612.
3. H. Matsumura: Jpn. J. Appl. Phys. 30 (1991) L1522.
4. J. Cifre, J. Bertmeu, J. Puigdollers, M. C. Polo, J. Andreu and A. Lloret: Appl. Phys. A 59 (1994) 645.
5. M. Heintze, R. Zedlitz, H. N. Wanka and M. B. Schubert: J. Appl. Phys. 79 (1996) 2699.
6. S. Yu, S. Deshpande, E. Gulari and J. Kanicki: Mater. Res. Soc. Symp. Proc. 377 (1995) 69.
7. A. Heya, A.-Q. He, N. Otsuka and H. Matsumura: J. Non-Cryst. Solids 227-230 (1998) 1016.
8. K. Yamamoto, M. Yoshimi, T. Suzuki, Y. Tawada, Y. Okamolo and A. Nakajima: Proc. 2nd World Conf. and Exhib. Photovoltaic Solar Energy Conversion, Vienna, 1998, p. 1284.
9. M. Kimura and S. Inoue: Dig. Tech. Pap. 1999 Int. Workshop on Active-Matrix Liquid-Crystal Displays, Tokyo, 1999, p. 263.
10. K. Sagara and E. Murakami: Appl. Phys. Lett. 54 (1989) 2003.
11. G. Baccarni and B. Ricco: J. Appl. Phys. 49 (1978) 5565.
12. M. R. Murti and K. V. Reddy: Phys. Status Solidi A 119 (1990) 237.
13. J.-H. Zhou, K. Ikuta, T. Yasuda, T. Umeda, S. Yamasaki and K. Tanaka: J. Non-Cryst. Solids 227-230 (1998) 857.
14. J. P. Conde, H. Silva and V. Chu: Mater. Res. Soc. Symp. Proc. 507 (1998) 909.
15. D. J. Eaglesham, H.-J. Gossmann and M. Cerullo: Phys. Rev. Lett. 65 (1990) 1227.