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Volumn 97, Issue 3, 2005, Pages

A highly stabilized hydrogenated amorphous silicon film having very low hydrogen concentration and an improved Si bond network

(3) Shimizu, Satoshi a Kondo, Michio a Matsuda, Akihisa a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN CONCENTRATIONS; LIGHT ILLUMINATION; PLASMA GENERATION; SURFACE SPIN DENSITY;

CHEMICAL BONDS; CONCENTRATION (PROCESS); CONFORMATIONS; FREE RADICALS; HYDROGEN; HYDROGENATION; INFRARED SPECTROSCOPY; OPTOELECTRONIC DEVICES; PARAMAGNETIC RESONANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCHOTTKY BARRIER DIODES; SILANES; SOLAR CELLS;

AMORPHOUS SILICON;

EID: 13744260705 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1846132 Document Type: Article

Times cited : (49)

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