Electric-field-enhanced crystallization of amorphous silicon

Nature

Volumn 395, Issue 6701, 1998, Pages 481-483

  Jang, Jin ^a   Oh, Jae Young ^a   Kim, Sung Ki ^a   Choi, Young Jin ^a   Yoon, Soo Young ^b   Kim, Chae Ok ^b  

^a Kyung Hee University   (South Korea)

^b Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; ELECTRIC FIELD EFFECTS; ELECTRON DIFFRACTION; FILM PREPARATION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; TRANSPORT PROPERTIES;

METAL INDUCED CRYSTALLIZATION; SOLID PHASE CRYSTALLIZATION;

AMORPHOUS SILICON;

NICKEL; SILICON DIOXIDE;

ARTICLE; CRYSTALLIZATION; ELECTRIC FIELD; FILM; PRIORITY JOURNAL; SEMICONDUCTOR;

EID: 3142561382     PISSN: 00280836     EISSN: None     Source Type: Journal    
DOI: 10.1038/26711     Document Type: Article

References (9)

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