Direct low-temperature chemical vapor deposition of fully crystalline micro- and polycrystalline silicon thin films on SiO2 using plasma immersion ion implantation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 1, 2000, Pages 51-57

  Huh, Hwang ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; ION IMPLANTATION; LOW TEMPERATURE OPERATIONS; PLASMA APPLICATIONS; SILANES; SILICA; THICKNESS MEASUREMENT; THIN FILMS;

BIAS VOLTAGES; GRAIN DENSITY; ION IRRADIATION; PLASMA IMMERSION ION IMPLANTATION; POLYCRYSTALLINE SILICON THIN FILMS;

SEMICONDUCTING SILICON;

EID: 0033722283     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582116     Document Type: Article

References (2)

1. Y. H. Yang and J. R. Abelson, Appl. Phys. Lett. 67, 3623 (1995).
2. D. M. Wolfe, F. Wang, and G. Lucovsky, Mater. Res. Soc. Symp. Proc. 472, 427 (1997).