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Volumn 71, Issue 11, 1997, Pages 1534-1536
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Growth of amorphous-layer-free microcrystalline silicon on insulating glass substrates by plasma-enhanced chemical vapor deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0001904230
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.119958 Document Type: Article |
Times cited : (51)
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References (10)
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