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Volumn 71, Issue 11, 1997, Pages 1534-1536

Growth of amorphous-layer-free microcrystalline silicon on insulating glass substrates by plasma-enhanced chemical vapor deposition

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[No Author keywords available]

Indexed keywords


EID: 0001904230     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119958     Document Type: Article
Times cited : (51)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.