Copper related diffusion phenomena in germanium and silicon

Materials Science in Semiconductor Processing

Volumn 7, Issue 3 SPEC. ISS., 2004, Pages 113-124

  Bracht, H ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

Copper; Diffusion; Germanium; Gettering; Segregation; Silicon; Solubility

Indexed keywords

CONTAMINATION; COPPER; DIFFUSION; ELECTRIC EQUIPMENT; FIELD EFFECT TRANSISTORS; PRECIPITATION (CHEMICAL); SILICON; SUBSTITUTION REACTIONS;

GETTERING; INTERSTITIAL MECHANISMS; SUBSTITUTIONAL LATTICE;

GERMANIUM;

EID: 5044230405     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2004.06.001     Document Type: Article

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