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Volumn 80, Issue 20, 2002, Pages 3706-3708
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Observation of dopant-mediated intermixing at Ge/Si Interface
a b a a |
Author keywords
[No Author keywords available]
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Indexed keywords
AS DOPING;
B-DOPING;
CODIFFUSION;
EXCESS VACANCY;
P-N JUNCTION DEPTH;
SECONDARY ION MASS SPECTROSCOPY;
SI SUBSTRATES;
DOPING (ADDITIVES);
HETEROJUNCTIONS;
INTERFACES (MATERIALS);
MIXING;
RAPID THERMAL ANNEALING;
SECONDARY ION MASS SPECTROMETRY;
SILICON;
GERMANIUM;
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EID: 79956040074
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1480485 Document Type: Article |
Times cited : (23)
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References (12)
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