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Volumn 222, Issue 1, 2000, Pages 319-326

Gettering of diffused Au and of Cu and Ni contamination in silicon by cavities induced by high energy He implantation

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EID: 0034336223     PISSN: 03701972     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3951(200011)222:1<319::AID-PSSB319>3.0.CO;2-Q     Document Type: Article
Times cited : (17)

References (18)
  • 2
    • 0001042380 scopus 로고
    • Eds. R. W. CAHN, P. HAASEN, and E. J. KRAMER, VCH, Weinheim
    • W. SCHRÖTER, M. SEIBT, and D. GILLES, Materials Science and Technology, Eds. R. W. CAHN, P. HAASEN, and E. J. KRAMER, Vol. 4, VCH, Weinheim 1991 (pp. 539-587).
    • (1991) Materials Science and Technology , vol.4 , pp. 539-587
    • Schröter, W.1    Seibt, M.2    Gilles, D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.