Characterization of out-of-band radiation and plasma parameters in laser-produced Sn plasmas for extreme ultraviolet lithography light sources

Journal of Applied Physics

Volumn 104, Issue 1, 2008, Pages

  Namba, S ^a   Fujioka, S ^b   Sakaguchi, H ^b   Nishimura, H ^b   Yasuda, Y ^b   Nagai, K ^b   Miyanaga, N ^b   Izawa, Y ^b   Mima, K ^b   Sato, K ^c   Takiyama, K ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c NATIONAL INSTITUTE FOR FUSION SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AIR POLLUTION; ANTENNA RADIATION; ATOMIC SPECTROSCOPY; CARRIER CONCENTRATION; ELECTRON DENSITY MEASUREMENT; ELECTRONS; EMISSION SPECTROSCOPY; EXTREME ULTRAVIOLET LITHOGRAPHY; IRRADIATION; LASER PULSES; LASERS; LIGHT; LIGHT SOURCES; LIGHTING; LITHOGRAPHY; PLASMAS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; RADIATION; TIN; TITANIUM COMPOUNDS; ULTRAVIOLET DEVICES;

BLACKBODY RADIATION (BBR); CONTINUUM EMISSION; CONTINUUM SPECTRUM; ELECTRON DENSITIES; EXTREME ULTRA-VIOLET (EUV); HIGH-DENSITY PLASMA (HDP); IN BAND; INTENSE (CO); LASER IRRADIATIONS; LINE BROADENING; LINE EMISSIONS; OUT OF BAND RADIATION; OUT-OF-BAND (OOB); PLASMA PARAMETERS; SHORT-PULSE LASERS; SPATIOTEMPORAL BEHAVIORS; SPECTRAL DISTRIBUTIONS; SPECTROSCOPIC OBSERVATIONS; TARGET SURFACES; TIN PLASMAS;

PLASMA DIAGNOSTICS;

EID: 47749102936     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2952033     Document Type: Article

References (39)

1. K. Kemp and S. Wurm, C. R. Phys. 1631-0705 10.1016/j.crhy.2006.10.002 7, 875 (2006).
2. J. Jonkers, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/15/ 2/S02 15, S8 (2006).
3. P. J. Silverman, J. Microlithogr., Microfabr., Microsyst. 1537-1646 10.1117/1.1862647 4, 011006 (2005).
4. D. Brandt, I. Fomenkov, A. Ershov, W. Partlo, D. Myers, N. Wering, A. Bykanov, G. Vaschenko, O. Khodykin, J. Hoffman, E. Vargas, R. Simmons, J. Chavez, and C. Chrobak, Proc. SPIE 0277-786X 10.1117/12.713279 6517, 65170Q (2007).
5. H. Tanaka, A. Tatsumoto, K. Akinaga, A. Takahashi, and T. Okada, Appl. Phys. Lett. 0003-6951 10.1063/1.1989441 87, 041503 (2005).
6. P. Hayden, A. Cummings, N. Murphy, G. O'Sullivan, P. Sheridan, J. White, and P. Duune, J. Appl. Phys. 0021-8979 10.1063/1.2191477 99, 093302 (2006).
7. S. S. Harilal, B. O'Shay, M. S. Tillack, Y. Tao, R. Paguio, A. Nikroo, and C. A. Back, J. Phys. D 0022-3727 10.1088/0022-3727/39/3/010 39, 484 (2006).
8. A. Endo, H. Hoshino, T. Suganuma, M. Moriya, T. Ariga, Y. Ueno, M. Nakano, T. Asayama, T. Abe, H. Komori, G. Soumagne, H. Mizoguchi, A. Sumitani, and K. Toyoda, Proc. SPIE 0277-786X 10.1117/12.711097 6517, 65170O (2007).
9. V. Borisov, A. Eltzov, A. Ivanov, O. Khristoforov, Y. Kirykhin, A. Vinokhodov, V. Vodchits, V. Mishhenko, and A. Prokofiev, Proc. SPIE 0277-786X 10.1117/12.740582 6611, 661108 (2007).
10. J. Pankert, K. Bergmann, G. Derra, M. Janssen, J. Jonkers, J. L. Klein, T. Krucken, A. List, M. Loeken, C. Metzmacher, W. Neff, S. Probst, R. Prummer, O. Rosier, S. Seiwert, G. Siemons, D. Vaudrevange, D. Wagemann, A. Weber, P. Zink, and O. Zitzen, Proc. SPIE 0277-786X 10.1117/12.598650 5751, 260 (2005).
11. I. Song, Y. Kobayashi, T. Sakamoto, S. R. Mohanty, M. Watanabe, A. Okino, T. Kawamura, K. Yasuoka, K. Horioka, and E. Hotta, Microelectron. Eng. 0167-9317 10.1016/j.mee.2006.01.001 83, 710 (2006).
12. C. Keyser, G. Schriever, M. Richardson, and E. Turcu, Appl. Phys. A: Mater. Sci. Process. 0947-8396 A77, 217 (2003).
13. L. Rymell and H. M. Hertz, Rev. Sci. Instrum. 0034-6748 10.1063/1.1146174 66, 4916 (1995).
14. S. Bollanti, F. Bonfigli, E. Burattini, P. D. Lazzaro, F. Flora, A. Grilli, T. Letardi, N. Lisi, A. Marinai, L. Mezi, D. S. Murra, and C. Zheng, Appl. Phys. B: Lasers Opt. 0946-2171 10.1007/s00340-002-1088-0 76, 277 (2003).
15. M. Richardson, C. -S. Koay, K. Takenoshita, and C. Keyser, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.1667511 22, 785 (2004).
16. S. Fujioka, H. Nishimura, K. Nishihara, M. Murakami, Y-G. Kang, Y. Shimada, A. Sunahara, H. Furukawa, Q. Gu, K. Nagai, T. Norimatsu, N. Miyanaga, Y. Izawa, and K. Mima, Appl. Phys. Lett. 0003-6951 10.1063/1.2142102 87, 241503 (2005).
17. S. Namba, S. Fujioka, H. Nishimura, U. Yasuda, K. Nagai, N. Miyanaga, Y. Izawa, K. Mima, and K. Takiyama, Appl. Phys. Lett. 0003-6951 10.1063/1.2199494 88, 171503 (2006).
18. O. Morris, P. Hayden, F. O'Reilly, N. Murphy, P. Dunne, and V. Bakshi, Appl. Phys. Lett. 0003-6951 10.1063/1.2769940 91, 081506 (2007).
19. H. Komori, Y. Ueno, H. Hoshino, T. Ariga, G. Soumagne, A. Endo, and H. Mizoguchi, Appl. Phys. B: Lasers Opt. 0946-2171 10.1007/s00340-006-2172-7 83, 213 (2006).
20. R. Stuik, F. Scholze, J. Tümmler, and F. Bijkerk, Nucl. Instrum. Methods Phys. Res. A 0168-9002 10.1016/S0168-9002(02)01350-5 492, 305 (2002).
21. K. Ota, Y. Watanabe, V. Banine, and H. Franken, in EUV Sources for Lithography, edited by, V. Bakshi, (SPIE, Bellingham, WA, 2006), pp. 27-41.
22. E. Louis, R. W. E. van de Kruijs, A. E. Yakshin, S. Alonso van der Westen, F. Bijkerk, M. M. J. W. van Herpen, D. J. W. Klunder, L. Bakker, H. Enkisch, S. Müllender, M. Richter, and V. Banine, Proc. SPIE 0277-786X 10.1117/12.675132 6151, 615139 (2006).
23. T. Feigl, S. Yulin, T. Kuhlmann, and N. Kaiser, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.41.4082 41, 4082 (2002).
24. M. Masnavi, M. Nakajima, E. Hotta, K. Horioka, G. Niimi, and A. Sasaki, J. Appl. Phys. 0021-8979 10.1063/1.2434987 101, 033306 (2007).
25. A. Cummings, G. O'Sullivan, P. Dunne, E. Sokell, N. Murphy, J. White, P. Hayden, P. Sheridan, M. Lysaght, and F. O'Reilly, J. Phys. D 0022-3727 10.1088/0022-3727/39/1/013 39, 73 (2006).
26. F. Claeyssens, A. Cheesman, S. J. Hnley, and M. N. Ashfold, J. Appl. Phys. 0021-8979 10.1063/1.1518782 92, 6886 (2002).
27. D. Geohegan, Appl. Phys. Lett. 0003-6951 10.1063/1.108659 62, 1463 (1993).
28. H. Sakaguchi, S. Fujioka, S. Namba, H. Tanuma, H. Ohashi, S. Suda, M. Shimomura, Y. Nakai, Y. Kimura, Y. Yasuda, H. Nishimura, T. Norimatsu, A. Sunahara, K. Nishihara, N. Miyanaga, Y. Izawa, and K. Mima, Appl. Phys. Lett. 0003-6951 10.1063/1.2901875 92, 111503 (2008).
29. H. R. Griem, Plasma Spectroscopy (McGraw-Hill, New York, 1964).
30. R. W. P. McWhirter, in Plasma Diagnostic Techniques, edited by, R. H. Huddlestone, and, S. L. Leonard, (Academic, New York, 1965).
31. J. D. Hey and P. Breger, J. Quant. Spectrosc. Radiat. Transf. 0022-4073 10.1016/0022-4073(80)90108-9 23, 311 (1980).
32. M. S. Dimitrijević and N. Konjević, J. Quant. Spectrosc. Radiat. Transf. 0022-4073 10.1016/0022-4073(83)90072-9 30, 45 (1983).
33. S. Djeniže, A. Srećković, J. Labat, R. Konjević, and M. Bronović, Z. Phys. D: At., Mol. Clusters 0178-7683 10.1007/BF01436597 24, 1 (1992).
34. H. R. Griem, Phys. Rev.. 165, 258 (1968).
35. M. H. Miller, R. A. Roig, and R. D. Bengtson, Phys. Rev. A 1050-2947 10.1103/PhysRevA.20.499 20, 499 (1979).
36. S. S. Harilal, B. O'Shay, M. S. Tillack, and M. V. Mathew, J. Appl. Phys. 0021-8979 10.1063/1.1977200 98, 013306 (2005).
37. M. V. Mathew, S. S. Harilal, and M. S. Tillack, J. Phys. D 0022-3727 10.1088/0022-3727/40/2/021 40, 447 (2007).
38. S. Namba, R. Nozu, K. Takiyama, and T. Oda, J. Appl. Phys. 0021-8979 10.1063/1.2190715 99, 073302 (2006).
39. P. K. Carroll, E. T. Kennedy, and G. O'Sullivan, Opt. Lett. 2, 72 (1978). 0146-9592