Performance of gas jet type Z-pinch plasma light source for EUV lithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 710-713

  Song, Inho ^a   Kobayashi, Yasunori ^a   Sakamoto, Toshiro ^a   Mohanty, Smruti R ^b   Watanabe, Masato ^a   Okino, Akitoshi ^a   Kawamura, Toru ^a   Yasuoka, Koichi ^a   Horioka, Kazuhiko ^a   Hotta, Eiki ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b Centre of Plasma Physics   (India)

Author keywords

Debris shielding; EUV; Gas curtain; Gas jet type Z pinch

Indexed keywords

BANDWIDTH; DIFFUSERS (FLUID); ELECTRODES; HELIUM; LITHOGRAPHY; PINCH EFFECT; PLASMA FLOW; ULTRAVIOLET RADIATION; XENON;

DEBRIS SHIELDING; EUV; GAS CURTAIN; GAS JET TYPE Z-PINCH;

PLASMA SOURCES;

EID: 33646488686     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.001     Document Type: Article

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