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Volumn 92, Issue 11, 2008, Pages

Absolute evaluation of out-of-band radiation from laser-produced tin plasmas for extreme ultraviolet lithography

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE COUPLED DEVICES; EXTREME ULTRAVIOLET LITHOGRAPHY; LASER APPLICATIONS; RADIATION; THERMAL CONDUCTIVITY;

EID: 41049103430     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2901875     Document Type: Article
Times cited : (37)

References (18)
  • 1
    • 41049085171 scopus 로고    scopus 로고
    • EUV Source for Lithography (SPIE, Washington),.
    • V. Bakshi, EUV Source for Lithography (SPIE, Washington, 2006), p. 3.
    • (2006) , pp. 3
    • Bakshi, V.1
  • 5
    • 18144431400 scopus 로고    scopus 로고
    • PRLTAO 0031-9007 10.1103/PhysRevLett.94.015004.
    • T. Aota and T. Tomie, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.94.015004 94, 015004 (2005).
    • (2005) Phys. Rev. Lett. , vol.94 , pp. 015004
    • Aota, T.1    Tomie, T.2
  • 11
    • 41049105066 scopus 로고    scopus 로고
    • Development and Application of Extreme Ultraviolet Light Source (CMC, Tokyo, Japan), [in Japanese].
    • Y. Watanabe, Development and Application of Extreme Ultraviolet Light Source (CMC, Tokyo, Japan, 2007), p. 165 [in Japanese].
    • (2007) , pp. 165
    • Watanabe, Y.1
  • 16
    • 41049109186 scopus 로고    scopus 로고
    • See: http://www.uvsor.ims.ac.jp/index.html
    • See: http://www.uvsor.ims.ac.jp/index.html


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.