Extreme ultraviolet lithography: Overview and development status

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 1, 2005, Pages 1-5

  Silverman, Peter J ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXPOSURE TOOLS; EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; HIGH-VOLUME PRODUCTION; IMMERSION LITHOGRAPHY;

COSTS; OPTICAL SYSTEMS; PRODUCTION; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 24144498792     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1862647     Document Type: Article

References (9)

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2. W. D. Domke et al., "Resist characterization for EUV-lithography," 2nd Intl. Extreme Ultra-Violet Lithography (EUVL) Symp., Antwerp/ Belgium, Sept. 2003.
3. K. A. Goldberg et al., "VNL research in interferometry for EUV optics," 1st Intl. Extreme Ultra-Violet Lithography (EUVL) Symp., Dallas/Texas, Oct. 2002.
4. C. W. Gwyn, "EUV lithography in perspective," 2nd Intl. Extreme Ultra-Violet Lithography (EUVL) Symp., Antwerp/Belgium, Sept. 2003.
5. H. Kinoshita et al., J. Vac. Sci. Technol. B 7, 1648 (1989).
6. C. Krautschik et al., "Implementing flare compensation for EUV masks through localized mask CD resizing," Proc. SPIE 5307, 58-68 (2003).
7. P. Kürz, "The EUV optics development program at Carl Zeiss SMT AG," 2nd Intl. Extreme Ultra-Violet Lithography (EUVL) Symp., Antwerp/Belgium, Sept. 2003.
8. J. Pankert et al., "Philips's EUV lamp: status and roadmap," 2nd Intl. Extreme Ultra-Violet Lithography (EUVL) Symp., Antwerp/Belgium, Sept. 2003.
9. U. Stamm et al., "High power gas discharge and laser produced plasma sources for EUV lithography," 2nd Intl. Extreme Ultra-Violet Lithography (EUVL) Symp., Antwerp/Belgium, Sept. 2003.