EUV radiation characteristics of a CO2 laser produced Xe plasma

Applied Physics B: Lasers and Optics

Volumn 83, Issue 2, 2006, Pages 213-218

  Komori, H ^a   Ueno, Y ^a   Hoshino, H ^a   Ariga, T ^a   Soumagne, G ^a   Endo, A ^a   Mizoguchi, H ^a  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; IONS; LASER PULSES; MAGNETIC FIELD EFFECTS; OSCILLATORS (ELECTRONIC); PHOTOLITHOGRAPHY; SEMICONDUCTOR LASERS; ULTRAVIOLET RADIATION; XENON;

ION ENERGY DISTRIBUTION; LIQUID JET PLASMA; MASTER OSCILLATOR POWER AMPLIFIER SYSTEM (MOPA); MAXIMUM CONVERSION EFFICIENCY;

LASER PRODUCED PLASMAS;

EID: 33645718452     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-006-2172-7     Document Type: Article

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