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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4082-4085

Damage resistant and low stress EUV multilayer mirrors

(4) Feigl, Torsten a Yulin, Sergiy a Kuhlmann, Thomas a Kaiser, Norbert a

a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING (Germany)

Author keywords

EUVL; Mo Si; Mo2C Si; Multilayer mirrors; Residual stress; Sputtering; Thermal stability

Indexed keywords

ANNEALING; MAGNETRON SPUTTERING; MOLYBDENUM; MULTILAYERS; RESIDUAL STRESSES; SILICON; THERMODYNAMIC STABILITY; ULTRAVIOLET DEVICES;

MULTILAYER MIRRORS;

MIRRORS;

EID: 0036614412 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.4082 Document Type: Article

Times cited : (21)

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