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Volumn 76, Issue 3, 2003, Pages 277-284

High-efficiency clean EUV plasma source at 10-30 nm, driven by a long-pulse-width excimer laser

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE COUPLED DEVICES; EXCIMER LASERS; IRRADIATION; LITHOGRAPHY; PHOTONS;

EID: 0038296003     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-002-1088-0     Document Type: Article
Times cited : (31)

References (32)
  • 17
    • 33646415749 scopus 로고    scopus 로고
    • G.M. Zeng, H. Daido, T. Nishikawa, H. Takabe, S. Nakayama, H. Aritome, K. Murai, Y. Kato, M. Nakatsuka, S. Nakai: J. Appl. Phys. 75, 1923 (1994); see also F. Bijkerk, A.P. Shevelko, L.A. Shmaenok, S.S. Churilov: Proc. SPIE 3157, 236 (1997)
    • (1997) Proc. SPIE , vol.3157 , pp. 236
    • Bijkerk, F.1    Shevelko, A.P.2    Shmaenok, L.A.3    Churilov, S.S.4
  • 27
    • 0038419719 scopus 로고    scopus 로고
    • Italian Patent No. RM2000 A000636 (2000)
    • F. Flora, L. Mezi, C. Zheng: Italian Patent No. RM2000 A000636 (2000)
    • Flora, F.1    Mezi, L.2    Zheng, C.3
  • 32
    • 0038419718 scopus 로고    scopus 로고
    • Web site: http://cindy.lbl.gov/optical_constants


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.