Multilayer optics with spectral purity layers for the EUV wavelength range

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Louis, E ^a   Van De Kruijs, R W E ^a   Yakshin, A E ^a   Van Der Westen, S Alonso ^a   Bijkerk, F ^a   Van Herpen, M M J W ^b   Klunder, D J W ^b   Bakker, L ^b   Enkisch, H ^c   Mullender S ^c   Richter, M ^d   Banine, V ^e  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

^c CARL ZEISS SMT AG   (Germany)

^d PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^e ASML   (Netherlands)

Author keywords

EUV Lithography; Mo Si multilayers; Out of band radiation

Indexed keywords

DEPOSITION; LIGHT REFLECTION; LITHOGRAPHY; OPTICS; SPECTRUM ANALYSIS; ULTRAVIOLET RADIATION;

EUV LITHOGRAPHY; MO/SI MULTILAYERS; OUT OF BAND RADIATION;

MULTILAYERS;

EID: 33745632028     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.675132     Document Type: Conference Paper

References (9)

1. R. Stuik, Nucl.Instr.Meth. A 492 (1-2), (2002) 305
2. F. Bijkerk et al., Sematech EUVL source workshop, Myazaki, Japan, 2004
3. L.A. Shmaenok et al, Sematech EUV Source Workshop, San Diego 2005
4. E. Louis et al., Microelectronic engineering 23, (1994) 215-218
5. E. Spiller, Soft X-ray optics, SPIE Optical Engineering Press, Bellingham, Washington, USA, (1994) 170
6. R. Schlatmann, S. Lu, J. Verhoeven, E.J. Puik, M.J. van der Wiel, Appl. Surf. Sci 78, 1994, 147
7. J. Tümmler, H. Blume, G. Brandt, J. Eden, B. Meyer, H. Scherr, F. Scholz, G. Ulm, Proc. SPIE 5037, (2003) 265
8. A. Gottwald, U. Kroth, M. Letz, H. Schoeppe, M. Richter, Proc. SPIE 5538, (2004) 157-164
9. D.L. Windt, Computers in Physics 12, (1998), 360