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Volumn 3, Issue 12, 2007, Pages 2053-2056

Ambient AFM nanoscale oxidation of hydrogen-passivated silicon with conductive-diamond-coated probes

(4) Schmitz, Matthew J a Kinser, C Reagan a Cortes, Norma E a Hersam, Mark C a

a Northwestern University (United States)

Author keywords

Atomic force microscopy; Diamond; Nanolithography; Nanopatterning; Silicon

Indexed keywords

ATOMIC FORCE MICROSCOPY; HYDROGEN; NANOLITHOGRAPHY; OXIDATION;

CONDUCTIVE DIAMOND COATED PROBES; NANOPATTERNING;

SILICON;

HYDROGEN; LITHOGRAPHY; OXIDATION; SILICON;

DIAMOND; HYDROGEN; OXIDE; SILICON;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTRIC CONDUCTIVITY; METHODOLOGY; NANOTECHNOLOGY; OXIDATION REDUCTION REACTION; SCANNING ELECTRON MICROSCOPY;

DIAMOND; ELECTRIC CONDUCTIVITY; HYDROGEN; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; NANOTECHNOLOGY; OXIDATION-REDUCTION; OXIDES; SILICON;

EID: 37249090155 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.200700414 Document Type: Article

Times cited : (9)

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