Nanoscopic surface architecture based on scanning probe electrochemistry and molecular self-assembly

Journal of the American Chemical Society

Volumn 119, Issue 39, 1997, Pages 9226-9229

  Sugimura, Hiroyuki ^a,b   Nakagiri, Nobuyuki ^a  

^a NIKON CORPORATION   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

NANOPARTICLE;

ARTICLE; ELECTROCHEMISTRY; MEMBRANE STRUCTURE; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY;

EID: 0030760555     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja971027u     Document Type: Article

References (29)

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25. 26,27 The STM and AFM used were an SPI-3600 (Seiko Instruments) and an Autoprobe CP (Park Scientific Instruments), respectively. Due to the independence of AFM's feedback control from the patterning mechanism, i.e., electric current, AFM lithography has great versatility over a wide range of patterning conditions. Using AFM, we have achieved a maximum patterning speed of 500 μm/s and a lateral resolution of 20 nm. We believe that template preparation will be possible at this patterning speed, which is much higher than the speed of normal atomic manipulation.
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27. A microfabricated Si probe was used (Nanosensor, G2 T3-5 L125R; mechanical resonant frequency of about 250 kHz).
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