Evaluating probes for `electrical' atomic force microscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 1, 2000, Pages 418-427

  Trenkler, T ^a   Hantschel, T ^a   Stephenson, R ^a   De Wolf, P ^a,f   Vandervorst, W ^a,b   Hellemans, L ^b   Malave A ^c   Buchel D ^c   Oesterschulze, E ^c   Kulisch, W ^c   Niedermann, P ^d   Sulzbach, T ^e   Ohlsson, O ^e  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c UNIVERSITY OF KASSEL   (Germany)

^d CSEM   (Switzerland)

^e Nanosensors GmbH   (Germany)

^f Digital Instruments   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COATINGS; CONDUCTIVE FILMS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON MICROSCOPES; MATHEMATICAL MODELS; SEMICONDUCTOR DEVICES; SILICON SENSORS;

CONDUCTIVE PROBES; ELECTRICAL ATOMIC FORCE MICROSCOPY;

PROBES;

EID: 0033698950     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591205     Document Type: Article

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