Production of submicrometre fused silica gratings using laser-induced backside dry etching technique

Journal of Physics D: Applied Physics

Volumn 39, Issue 22, 2006, Pages 4843-4847

  Hopp, B ^a   Vass, Cs ^a   Smausz, T ^a   Bor, Zs ^a  

^a UNIVERSITY OF SZEGED   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; EXCIMER LASERS; FUSED SILICA; LASER BEAM EFFECTS; LIGHT SENSITIVE MATERIALS; MICROMACHINING;

FUSED SILICA GRATINGS; LASER INDUCED BACKSIDE DRY ETCHING (LIBDE); LASER MICROMACHINING; MICROOPTICAL ELEMENTS;

DIFFRACTION GRATINGS;

EID: 33846869503     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/39/22/015     Document Type: Article

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