Surface micromachining of UV transparent materials

Thin Solid Films

Volumn 453-454, Issue , 2004, Pages 31-35

  Kopitkovas, G ^a   Lippert, T ^a   David, C ^a   Wokaun, A ^a   Gobrecht, J ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

BaF2; CaF2; Laser ablation; Micro lens; Sapphire; Wet etching

Indexed keywords

CALCIUM COMPOUNDS; DIELECTRIC MATERIALS; ELECTROMAGNETIC WAVE ABSORPTION; ELECTRON BEAM LITHOGRAPHY; ETCHING; INTERFACES (MATERIALS); LASER ABLATION; MICROLENSES; MICROMACHINING; MICROSTRUCTURE; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

BAF2; CAF2; WET ETCHING;

SURFACE TREATMENT;

EID: 1642369894     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.074     Document Type: Conference Paper

References (14)

1. D. Flamm, A. Schindler, T. Harzendorf, E.B. Kley, Proc. SPIE (2003) in press.
2. Rosenfeld A., Lorenz M., Stoian R., Ashkenasi D. Appl. Phys. A. 69:1999;373.
3. Stuart B.C., Freit M.D., Hermann S., Rubenchik A.M., Shore B.W., Perry M.D. Phys. Rev. B. 49:1996;1749.
4. Ihlemann J., Wolf-Rottke B. Appl. Surf. Sci. 106:1996;282.
5. Marcinkeviius A., Juodkazis S., Watanabe M., Miwa M., Matsuo S., Misawa H., Nishii J. Opt. Lett. 26:2001;277.
6. Dolgaev S.I., Lyalin A.A., Simakin A.V., Shafeev G.A. Appl. Surf. Sci. 96-98:1996;491.
7. Wang J., Niino H., Yabe A. Appl. Phys. A. 68:1999;111.
8. Ding X., Yasui Y., Kawaguchi Y., Niino H., Yabe A. Appl. Phys. A. 75:2002;453.
9. Ding X., Kawaguchi Y., Niino H., Yabe A. Appl. Phys. A. 75:2002;641.
10. Zimmer K., Böhme R., Braun A., Rauchenbach B., Bigl F. Appl. Phys. A. 74:2002;453.
11. David C., Lippert T., Wei J., Wokaun A. Microelectron. Eng. 57-58:2001;453.
12. Kopitkovas G., Lippert T., David C., Wokaun A., Gobrecht J. Microelectron. Eng. 67-68:2003;438.
13. Isselin J.C., Alloncle A.P., Autric M. J. Appl. Phys. 84:1998;5766.
14. Küper S., Stuke M. Appl. Phys. A. 49:1989;211.