Comparing study of subpicosecond and nanosecond wet etching of fused silica

Applied Surface Science

Volumn 252, Issue 13 SPEC. ISS., 2006, Pages 4768-4772

  Vass, Cs ^a   Sebok, D ^a   Hopp, B ^b  

^a UNIVERSITY OF SZEGED   (Hungary)

^b RESEARCH GROUP ON LASER PHYSICS   (Hungary)

Author keywords

Fused silica; Subpicosecond krF laser system; Transparent materials; Wet etching

Indexed keywords

BUBBLE FORMATION; ETCHING; LASER APPLICATIONS; LASER PULSES; PHOTOGRAPHY; THERMAL EFFECTS; TRANSPARENCY;

PYRENE-ACETONE SOLUTIONS; SUBPICOSECOND KRF LASER SYSTEMS; TRANSPARENT MATERIALS; WET ETCHING;

FUSED SILICA;

EID: 33646717317     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.07.118     Document Type: Article

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