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Journal of Photochemistry and Photobiology A: Chemistry

Volumn 158, Issue 2-3, 2003, Pages 179-182

Surface micro-fabrication of silica glass by excimer laser irradiation of organic solvent

(7) Niino, Hiroyuki a Yasui, Yoshimi a Ding, Ximing a Narazaki, Aiko a Sato, Tadatake a Kawaguchi, Yoshizo a Yabe, Akira a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

Ablation; ns Pulsed UV laser; Shock wave; Silica glass; Toluene

Indexed keywords

ACETONE; GLASS; ORGANIC SOLVENT; PYRENE; SILICON DIOXIDE; TOLUENE;

ARTICLE; CHEMICAL PROCEDURES; CONCENTRATION (PARAMETERS); CONTROLLED STUDY; EXCIMER LASER; EXCITATION; HIGH TEMPERATURE; HIGH TEMPERATURE PROCEDURES; LASER; MICROSCOPY; SHOCK WAVE; ULTRAVIOLET IRRADIATION;

EID: 0037414629 PISSN: 10106030 EISSN: None Source Type: Journal
DOI: 10.1016/S1010-6030(03)00032-7 Document Type: Article

Times cited : (101)

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