Experiments and numerical calculations for the interpretation of the backside wet etching of fused silica

Thin Solid Films

Volumn 453-454, Issue , 2004, Pages 121-126

  Vass, Cs ^a   Hopp, B ^a   Smausz, T ^a   Ignacz F ^a  

^a UNIVERSITY OF SZEGED   (Hungary)

Author keywords

Absorption coefficient measurement; Excimer laser; Fused silica; Plano concave microcuvette; Wet etching

Indexed keywords

ETCHING; EXCIMER LASERS; LASER ABLATION; LASER APPLICATIONS; LIGHT ABSORPTION; NAPHTHALENE; THERMAL EFFECTS;

ABSORPTIN COEFFICIENT MEASUREMENT; PLANO-CONCAVE MICROCUVETTE; WET ETCHING;

FUSED SILICA;

EID: 1542426361     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.081     Document Type: Conference Paper

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