Excimer laser-induced etching of sub-micron surface relief gratings in fused silica using phase grating projection

Applied Physics A: Materials Science and Processing

Volumn 74, Issue 4, 2002, Pages 453-456

  Zimmer, K ^a   Bohme R ^a   Braun, A ^a   Rauschenbach, B ^a   Bigl, F ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIELECTRIC MATERIALS; DIFFRACTION GRATINGS; ETCHING; EXCIMER LASERS; HOLOGRAPHY; LITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

PHASE GRATING PROJECTION; SINUSOIDAL GRATINGS;

FUSED SILICA;

EID: 0036534419     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390101184     Document Type: Article

References (15)

1. Backside etching of UV-transparent materials at the interface of liquids