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Applied Physics A: Materials Science and Processing

Volumn 82, Issue 2, 2006, Pages 325-328

Laser backside etching of fused silica due to carbon layer ablation

(3) Bohme R a Zimmer, K a Rauschenbach, B a

a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; ETCHING; LASER ABLATION; LASER PRODUCED PLASMAS;

LASER BACKSIDE ETCHING; LESAL; LIBWE;

FUSED SILICA;

EID: 28544448271 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-005-3387-x Document Type: Article

Times cited : (53)

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