Laser-induced back-side wet etching of fused silica with an aqueous solution containing organic molecules

Applied Physics A: Materials Science and Processing

Volumn 75, Issue 3, 2002, Pages 437-440

  Ding, X ^a   Yasui, Y ^a   Kawaguchi, Y ^a   Niino, H ^a   Yabe, A ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; DYES; ETCHING; EXCIMER LASERS; LASER BEAM EFFECTS; LIGHT SOURCES; MICROCRACKS; RATE CONSTANTS; SOLUTIONS;

WET ETCHING;

FUSED SILICA;

EID: 0036722042     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390101131     Document Type: Article

References (17)