Laser etching of fused silica using an adsorbed toluene layer

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 8, 2004, Pages 1883-1885

  Zimmer, K ^a   Bohme R ^a   Rauschenbach, B ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON DIOXIDE; ETCHING; IRRADIATION; LASER PULSES; LASERS; LIGHT INTERFERENCE; RADIATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING GALLIUM ARSENIDE; SURFACE ROUGHNESS; SURFACE STRUCTURE; THRESHOLD ELEMENTS; TOLUENE;

INORGANIC TRANSPARENT MATERIALS; LASER ETCHING; SURFACE QUALITY; TOLUENE LAYERS;

FUSED SILICA;

EID: 6344282355     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2961-y     Document Type: Article

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