Surface characterization of backside-etched transparent dielectrics

Thin Solid Films

Volumn 453-454, Issue , 2004, Pages 127-132

  Bohme R ^a   Spemann, D ^b   Zimmer, K ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

^b UNIVERSITY OF LEIPZIG   (Germany)

Author keywords

Fused silica; Laser etching; Liquid interface; Quartz

Indexed keywords

AMORPHIZATION; BENZENE; COMPOSITION; CONTAMINATION; CRYSTALLINE MATERIALS; ETCHING; EVAPORATION; FUSED SILICA; INTERFACES (MATERIALS); LASER APPLICATIONS; RAMAN SPECTROSCOPY; SURFACE ROUGHNESS; SURFACE TOPOGRAPHY; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

LASER ETCHING; LIQUID INTERFACE;

DIELECTRIC MATERIALS;

EID: 1542426356     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.083     Document Type: Conference Paper

References (21)

1. Wang J., Niino H., Yabe A. Appl. Phys. A. 68:1999;111-113.
2. Wang J., Niino H., Yabe A. Appl. Surf. Sci. 154/155:2000;571-576.
3. Böhme R., Braun A., Zimmer K. Appl. Surf. Sci. 186:2002;276-281.
4. Zimmer K., Böhme R., Braun A., Rauschenbach B., Bigl F. Appl. Phys. A. 74:(4):2002;453-456.
5. R. Böhme, Diploma Thesis, University of Applied Science Mittweida, Mittweida, 2001.
6. Wang J., Niino H., Yabe A. Jpn. J. Appl. Phys. 38:1999;761-763.
7. Zimmer K., Braun A., Böhme R. Appl. Surf. Sci. 208/209:2003;199-204.
8. Kim D., Ye M., Grigoropoulos C.P. Appl. Phys. A. 67:1998;169-181.
9. Tsuboi Y., Fukumura H., Masuhara H. Appl. Phys. Lett. 64:1994;2745-2747.
10. Paltauf G., Schmidt-Kloiber H. Appl. Phys. A. 62:1996;303-311.
11. Dolgaev S.I., Voronov V.V., Shafeev G.A. Appl. Phys. A. 66:1998;87-92.
12. Dolgaev S.I., Kirichenko N.A., Shafeev G.A. Appl. Surf. Sci. 138/139:1998;449-454.
13. Lyalin A.A., Simakin A.V., Shafeev G.A., Loubnin E.N. Appl. Phys. A. 68:1999;373-376.
14. Simakin A.V., Loubnin E.N., Shafeev G.A. Appl. Phys. A. 69:1999;267-269.
15. Vogt J., Flagmeyer R.-H., Heitmann J., Lehmann D., Reinert T., Jankuhn St., Spemann D., Tröger W., Butz T. Mikrochim. Acta. 133:2000;105-111.
16. Doolittle L.R. Nucl. Instrum. Meth. B. 9:1985;344-351.
17. Hesse R., Chassé T., Szargan R. Fresenius J. Anal. Chem. 365:1999;48-54.
18. Niino H., Yassui Y., Ding X., Narazaki A., Sato T., Yabe A. J. Photochem. Photobiol. A. 158:2003;179-182.
19. Avila A., Montero I., Galán L., Risalda J.M., Levy R. J. Appl. Phys. 89:2001;212-216.
20. Shafeev G.A., Simakin A.V., Lyalin A.A., Obraztsova E.D., Frolov V.D. Appl. Surf. Sci. 138/139:1999;461-464.
21. P. Umari, A. Pasquarello, A.D. Corso, Phys. Rev. B 63 (2001) 094305/1-9.