Etching of fused silica and glass with excimer laser at 351 nm

Applied Surface Science

Volumn 208-209, Issue 1, 2003, Pages 199-204

  Zimmer, K ^a   Braun, A ^a   Bohme R ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

Excimer laser; Glass; Laser etching; Liquid interface

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONTACTS (FLUID MECHANICS); EXCIMER LASERS; FUSED SILICA; GLASS; MICROMACHINING; SURFACE ROUGHNESS; DIELECTRIC MATERIALS; PHOTOLITHOGRAPHY; POLYMERS;

THRESHOLD FLUENCES; PULSED RADIATION; WET ETCHING;

ETCHING;

EID: 0037443169     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01372-7     Document Type: Conference Paper

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