-
1
-
-
0141775174
-
Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers
-
Canham L.T. Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers. Appl. Phys. Lett. 57:1990;1046-1048.
-
(1990)
Appl. Phys. Lett.
, vol.57
, pp. 1046-1048
-
-
Canham, L.T.1
-
2
-
-
0028441436
-
Violet and blue light emission from nanocrystalline silicon thin film
-
Zhao X., Schoenfeld O., Kusano J., Aoyagi Y., Sugano T. Violet and blue light emission from nanocrystalline silicon thin film. Jpn. J. Appl. Phys. 33:1994;L649-L651.
-
(1994)
Jpn. J. Appl. Phys.
, vol.33
-
-
Zhao, X.1
Schoenfeld, O.2
Kusano, J.3
Aoyagi, Y.4
Sugano, T.5
-
3
-
-
0028550702
-
Sol-gel method for synthesizing visible photoluminescent nanosized Ge-crystal-doped silica glasses
-
Nogami M., Abe Y. Sol-gel method for synthesizing visible photoluminescent nanosized Ge-crystal-doped silica glasses. Appl. Phys. Lett. 65:1994;2545-2547.
-
(1994)
Appl. Phys. Lett.
, vol.65
, pp. 2545-2547
-
-
Nogami, M.1
Abe, Y.2
-
8
-
-
0029357965
-
Visible electroluminescence from semitransparent Au film/extra thin Si-rich silicon oxide film/p-Si structure
-
Qin G.G., Li A.P., Zhang B.R., Li B.C. Visible electroluminescence from semitransparent Au film/extra thin Si-rich silicon oxide film/p-Si structure. J. Appl. Phys. 78:1995;2006-2009.
-
(1995)
J. Appl. Phys.
, vol.78
, pp. 2006-2009
-
-
Qin, G.G.1
Li, A.P.2
Zhang, B.R.3
Li, B.C.4
-
9
-
-
0030149021
-
Blue photoluminescence from Si-doped amorphous silica films by RF sputtering
-
Yoshida S., Hanada T., Tanabe S., Soga N. Blue photoluminescence from Si-doped amorphous silica films by RF sputtering. Jpn. J. Appl. Phys. 35:1996;2694-2697.
-
(1996)
Jpn. J. Appl. Phys.
, vol.35
, pp. 2694-2697
-
-
Yoshida, S.1
Hanada, T.2
Tanabe, S.3
Soga, N.4
-
11
-
-
0021463321
-
Electroluminescence studies in silicon dioxide films containing tiny silicon islands
-
DiMaria D.J., Kirtley J.R., Pakulis E.J., Dong D.W., Kuan T.S., Pesavento F.L., et al. Electroluminescence studies in silicon dioxide films containing tiny silicon islands. J. Appl. Phys. 56:1984;401-416.
-
(1984)
J. Appl. Phys.
, vol.56
, pp. 401-416
-
-
DiMaria, D.J.1
Kirtley, J.R.2
Pakulis, E.J.3
Dong, D.W.4
Kuan, T.S.5
Pesavento, F.L.6
-
12
-
-
21544478900
-
Quantum size effects on photoluminescence in ultrafine Si particles
-
Takagi H., Ogawa H., Yamazaki Y., Ishizaki A., Nakagiri T. Quantum size effects on photoluminescence in ultrafine Si particles. Appl. Phys. Lett. 56:1990;2379-2380.
-
(1990)
Appl. Phys. Lett.
, vol.56
, pp. 2379-2380
-
-
Takagi, H.1
Ogawa, H.2
Yamazaki, Y.3
Ishizaki, A.4
Nakagiri, T.5
-
13
-
-
0000457513
-
Influence of the size dispersion on the emission spectra of the Si nanostructures
-
Khurgin J.B., Forsythe E.W., Tompa G.S., Kahn B.A. Influence of the size dispersion on the emission spectra of the Si nanostructures. Appl. Phys. Lett. 69:1996;1241-1243.
-
(1996)
Appl. Phys. Lett.
, vol.69
, pp. 1241-1243
-
-
Khurgin, J.B.1
Forsythe, E.W.2
Tompa, G.S.3
Kahn, B.A.4
-
14
-
-
0001315569
-
The origin of photoluminescence from thin films of silicon-rich silica
-
Kenyon A.J., Trwoga P.F., Pitt C.W., Rehm G. The origin of photoluminescence from thin films of silicon-rich silica. J. Appl. Phys. 79:1996;9291-9300.
-
(1996)
J. Appl. Phys.
, vol.79
, pp. 9291-9300
-
-
Kenyon, A.J.1
Trwoga, P.F.2
Pitt, C.W.3
Rehm, G.4
-
15
-
-
0000341168
-
Visible light-emitting device with Schottky contacts on an ultrathin amorphous silicon layer containing silicon nanocrystals
-
Fujita S., Sugiyama N. Visible light-emitting device with Schottky contacts on an ultrathin amorphous silicon layer containing silicon nanocrystals. Appl. Phys. Lett. 74:1999;308-310.
-
(1999)
Appl. Phys. Lett.
, vol.74
, pp. 308-310
-
-
Fujita, S.1
Sugiyama, N.2
-
17
-
-
0013360439
-
Si ion implantation-induced damage in fused silica probed by variable-energy positrons
-
Knights A.P., Simpson P.J., Allard L.B., Brebner J.L., Albert J. Si ion implantation-induced damage in fused silica probed by variable-energy positrons. J. Appl. Phys. 79:1996;9022-9028.
-
(1996)
J. Appl. Phys.
, vol.79
, pp. 9022-9028
-
-
Knights, A.P.1
Simpson, P.J.2
Allard, L.B.3
Brebner, J.L.4
Albert, J.5
-
19
-
-
1342307159
-
Strong blue and violet photoluminescence and electroluminescence from germanium-implanted and silicon-implanted silicon-dioxide layers
-
Rebohle L., Borany J., Yankov R.A., Skorupa W., Tyschenko I.E., Fröb H., et al. Strong blue and violet photoluminescence and electroluminescence from germanium-implanted and silicon-implanted silicon-dioxide layers. Appl. Phys. Lett. 71(19):1997;2809-2811.
-
(1997)
Appl. Phys. Lett.
, vol.71
, Issue.19
, pp. 2809-2811
-
-
Rebohle, L.1
Borany, J.2
Yankov, R.A.3
Skorupa, W.4
Tyschenko, I.E.5
Fröb, H.6
-
21
-
-
0002546762
-
Blue photo- and electroluminescence of silicon dioxide layers ion-implanted with group IV elements
-
Rebohle L., Borany J., Fröb H., Skorupa W. Blue photo- and electroluminescence of silicon dioxide layers ion-implanted with group IV elements. Appl. Phys. B71:2000;131-151.
-
(2000)
Appl. Phys.
, vol.B71
, pp. 131-151
-
-
Rebohle, L.1
Borany, J.2
Fröb, H.3
Skorupa, W.4
-
24
-
-
0032620189
-
2 film containing different density of Ge nanocrystals
-
2 film containing different density of Ge nanocrystals. Appl. Phys. Lett. 74(17):1999;2459-2461.
-
(1999)
Appl. Phys. Lett.
, vol.74
, Issue.17
, pp. 2459-2461
-
-
Zhang, J.Y.1
Ye, Y.H.2
Tan, X.L.3
-
27
-
-
0030122736
-
Visible photoluminescence from silicon nanocrystals formed in silicon dioxide by ion implantation and thermal processing
-
Shimizu-Iwayama T., Terao Y., Kamiya A., Takeda M., Nakao S., Saitoh K. Visible photoluminescence from silicon nanocrystals formed in silicon dioxide by ion implantation and thermal processing. Thin Solid Films. 276:1996;104-107.
-
(1996)
Thin Solid Films
, vol.276
, pp. 104-107
-
-
Shimizu-Iwayama, T.1
Terao, Y.2
Kamiya, A.3
Takeda, M.4
Nakao, S.5
Saitoh, K.6
-
31
-
-
21544432148
-
Room-temperature short wavelength (400-500 nm) photoluminescence from silicon-implanted silicon dioxide films
-
Skorupa W., Yankov R.A., Tyschenko I.E., Fröb H., Böhme T., Leo K. Room-temperature short wavelength (400-500 nm) photoluminescence from silicon-implanted silicon dioxide films. Appl. Phys. Lett. 68:1996;2410-2412.
-
(1996)
Appl. Phys. Lett.
, vol.68
, pp. 2410-2412
-
-
Skorupa, W.1
Yankov, R.A.2
Tyschenko, I.E.3
Fröb, H.4
Böhme, T.5
Leo, K.6
-
36
-
-
0031102861
-
Visible light emission from Si nanocrystals grown by ion implantation and subsequent annealing
-
Guha S., Pace M.D., Dunn D.N., Singer I.L. Visible light emission from Si nanocrystals grown by ion implantation and subsequent annealing. Appl. Phys. Lett. 70:1997;1207-1209.
-
(1997)
Appl. Phys. Lett.
, vol.70
, pp. 1207-1209
-
-
Guha, S.1
Pace, M.D.2
Dunn, D.N.3
Singer, I.L.4
-
42
-
-
0032099580
-
Optical properties of silicon nanoclusters fabricated by ion implantation
-
Shimizu-Iwayama T., Kurumado N., Hole D.E., Townsend P.D. Optical properties of silicon nanoclusters fabricated by ion implantation. J. Appl. Phys. 83(11):1998;6018-6022.
-
(1998)
J. Appl. Phys.
, vol.83
, Issue.11
, pp. 6018-6022
-
-
Shimizu-Iwayama, T.1
Kurumado, N.2
Hole, D.E.3
Townsend, P.D.4
-
52
-
-
0028519199
-
2 structure for analog-storage EEPROM applications
-
2 structure for analog-storage EEPROM applications. Solid-State Electron. 37:1994;1771-1774.
-
(1994)
Solid-state Electron.
, vol.37
, pp. 1771-1774
-
-
Ohzone, T.1
Hori, T.2
-
54
-
-
0032652745
-
A long-refresh dynamic/quasi-nonvolatile memory device with 2-nm tunneling oxide
-
King Y.C., King T.J., Hu C. A long-refresh dynamic/quasi-nonvolatile memory device with 2-nm tunneling oxide. IEEE Electron Dev. Lett. 20:1999;409-411.
-
(1999)
IEEE Electron Dev. Lett.
, vol.20
, pp. 409-411
-
-
King, Y.C.1
King, T.J.2
Hu, C.3
-
57
-
-
0019635233
-
Optical properties of phosphorus-doped polycrystalline silicon layers
-
Lubberts G., Burkey B.C., Moser F., Trabka E.A. Optical properties of phosphorus-doped polycrystalline silicon layers. J. Appl. Phys. 52:1981;6870-6878.
-
(1981)
J. Appl. Phys.
, vol.52
, pp. 6870-6878
-
-
Lubberts, G.1
Burkey, B.C.2
Moser, F.3
Trabka, E.A.4
-
59
-
-
0033100577
-
Study of the current-voltage characteristics in MOS capacitors with Si-implanted gate oxide
-
Kameda E., Matsuda T., Emura Y., Ohzone T. Study of the current-voltage characteristics in MOS capacitors with Si-implanted gate oxide. Solid-State Electron. 43:1999;555-563.
-
(1999)
Solid-state Electron.
, vol.43
, pp. 555-563
-
-
Kameda, E.1
Matsuda, T.2
Emura, Y.3
Ohzone, T.4
-
60
-
-
0004206716
-
-
Amsterdam: Elsevier
-
2 system. 1988;Elsevier, Amsterdam.
-
(1988)
2 System
-
-
Balk, P.1
-
64
-
-
84975428691
-
Wearout and breakdown in thin film oxide
-
Dumin D.J. Wearout and breakdown in thin film oxide. J. Electrochem. Soc. 142:1995;1272-1277.
-
(1995)
J. Electrochem. Soc.
, vol.142
, pp. 1272-1277
-
-
Dumin, D.J.1
|