Blue luminescence from Si+-implanted SiO2 films thermally grown on crystalline silicon

Applied Physics Letters

Volumn 68, Issue 6, 1996, Pages 850-852

  Liao, Liang Sheng ^a   Bao, Xi Mao ^a   Zheng, Xiang Qin ^a   Li, Ning Sheng ^a   Min, Nai Ben ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEFECTS; ION IMPLANTATION; LIGHT ABSORPTION; PARAMAGNETIC RESONANCE; PHOTOLUMINESCENCE; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; ULTRAVIOLET RADIATION;

BLUE LUMINESCENCE; DIAMAGNETIC DEFECTS; FULL WIDTH AT HALF MAXIMUM; OXYGEN VACANCY; PARAMAGNETIC DEFECTS; PHOTOLUMINESCENCE EXCITATION;

SILICA;

EID: 0030569871     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116554     Document Type: Article

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