메뉴 건너뛰기




Volumn 20, Issue 8, 1999, Pages 409-411

Long-refresh dynamic/quasi-nonvolatile memory device with 2-nm tunneling oxide

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TRAPS; OXIDES; RESPONSE TIME (COMPUTER SYSTEMS); SEMICONDUCTING SILICON;

EID: 0032652745     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.778160     Document Type: Article
Times cited : (43)

References (15)
  • 2
    • 84886448160 scopus 로고    scopus 로고
    • Single layer nitride capacitor dielectric film and high concentration doping technology for 1 Gb/4 Gb trench-type DRAM's
    • S. Saida, T. Sato, L. Mizushima, and Y. Ozawa, "Single layer nitride capacitor dielectric film and high concentration doping technology for 1 Gb/4 Gb trench-type DRAM's," in IEDM Tech. Dig., 1997, pp. 265-268.
    • (1997) IEDM Tech. Dig. , pp. 265-268
    • Saida, S.1    Sato, T.2    Mizushima, L.3    Ozawa, Y.4
  • 4
    • 84886448081 scopus 로고    scopus 로고
    • Trade-offs in the integration of high performance devices with trench capacitor DRAM
    • S. Crowder, S. Stiffler, P. Parries, and G. Bronner, "Trade-offs in the integration of high performance devices with trench capacitor DRAM," in IEDM Tech. Dig., 1997, pp. 45-48.
    • (1997) IEDM Tech. Dig. , pp. 45-48
    • Crowder, S.1    Stiffler, S.2    Parries, P.3    Bronner, G.4
  • 5
    • 0031212918 scopus 로고    scopus 로고
    • Flash memory cells - An overview
    • Aug.
    • P. Pavan, R. Bez, P. Olivo, and E. Zanoni, "Flash memory cells - An overview," Proc. IEEE, vol. 85, pp. 1248-1271, Aug. 1997.
    • (1997) Proc. IEEE , vol.85 , pp. 1248-1271
    • Pavan, P.1    Bez, R.2    Olivo, P.3    Zanoni, E.4
  • 6
    • 0001211292 scopus 로고    scopus 로고
    • A scalable single poly EEPROM cell for embedded memory applications
    • Aug.-Sept.
    • L. Baldi, A. Cascella, and B. Vajana, "A scalable single poly EEPROM cell for embedded memory applications," Microelectron. J., vol. 28, nos. 6-7, pp. 657-661, Aug.-Sept. 1997.
    • (1997) Microelectron. J. , vol.28 , Issue.6-7 , pp. 657-661
    • Baldi, L.1    Cascella, A.2    Vajana, B.3
  • 7
    • 0031699487 scopus 로고    scopus 로고
    • A new write/erase method to improve the read disturb characteristics based on the decay phenomena of stress leakage current for flash memories
    • Jan.
    • T. Endoh, K. Shimizu, H. Iizuka, and F. Masuoka, "A new write/erase method to improve the read disturb characteristics based on the decay phenomena of stress leakage current for flash memories," IEEE Trans. Electron Devices, vol. 45, pp. 98-104, Jan. 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , pp. 98-104
    • Endoh, T.1    Shimizu, K.2    Iizuka, H.3    Masuoka, F.4
  • 8
    • 85056969203 scopus 로고
    • Stress-induced current in thin silicon dioxide film
    • R. Moazzami and C. Hu, "Stress-induced current in thin silicon dioxide film," in IEDM Tech. Dig., 1992, p. 139.
    • (1992) IEDM Tech. Dig. , pp. 139
    • Moazzami, R.1    Hu, C.2
  • 9
    • 0028430427 scopus 로고
    • 2 breakdown model for very low voltage lifetime extrapolation
    • May
    • 2 breakdown model for very low voltage lifetime extrapolation," IEEE Trans. Electron Devices, vol. 41, pp. 761-767, May 1994.
    • (1994) IEEE Trans. Electron Devices , vol.41 , pp. 761-767
    • Schuegraf, K.F.1    Hu, C.2
  • 10
    • 0029409435 scopus 로고
    • High-endurance ultra-thin tunnel oxide in MONOS device structure for dynamic memory application
    • Nov.
    • H.C. Wann and C. Hu, "High-endurance ultra-thin tunnel oxide in MONOS device structure for dynamic memory application," IEEE Electron Devices Lett., vol. 16, pp. 491-493, Nov. 1995.
    • (1995) IEEE Electron Devices Lett. , vol.16 , pp. 491-493
    • Wann, H.C.1    Hu, C.2
  • 11
    • 0024732443 scopus 로고
    • 2 films
    • Sept.-Oct.
    • 2 films," J. Mater. Res., vol. 4, no. 5, pp. 1233-1237, Sept.-Oct. 1989.
    • (1989) J. Mater. Res. , vol.4 , Issue.5 , pp. 1233-1237
    • Lopez, M.1    Falcony, C.2
  • 13
    • 0030241362 scopus 로고    scopus 로고
    • Fast and long retention-time nanocrystal memory
    • Sept.
    • H. I. Hanafi, S. Tiwari, and I. Khan, "Fast and long retention-time nanocrystal memory," IEEE Trans. Electron Devices, vol. 43, pp. 1553-1558, Sept. 1996.
    • (1996) IEEE Trans. Electron Devices , vol.43 , pp. 1553-1558
    • Hanafi, H.I.1    Tiwari, S.2    Khan, I.3
  • 14
    • 0030084860 scopus 로고    scopus 로고
    • Comparing models for the growth of silicon-rich oxides (SRO)
    • Feb.
    • G. Dundar and K. Rose, "Comparing models for the growth of silicon-rich oxides (SRO)," IEEE Trans. Semiconduct. Manufact., vol. 9, pp. 74-81, Feb. 1996.
    • (1996) IEEE Trans. Semiconduct. Manufact. , vol.9 , pp. 74-81
    • Dundar, G.1    Rose, K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.