Structures and properties of fluorinated amorphous carbon films

Journal of Applied Physics

Volumn 96, Issue 1, 2004, Pages 354-360

  Huang, K P ^a   Lin, P ^a   Shih, H C ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; ELECTRON CYCLOTRON RESONANCE; FLUORINE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FREQUENCIES; MICROWAVES; PHOTOLUMINESCENCE; PLASMAS;

AMORPHOUS CARBON FILMS; ENERGY BAND GAP; FLUOROCARBON BONDS; PHOTOLUMINESCENCE LIFETIME;

AMORPHOUS FILMS;

EID: 3142681104     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1755849     Document Type: Article

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