Plasma chemistry in fluorocarbon film deposition from pentafluoroethane/argon mixtures

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 6, 1999, Pages 3265-3271

  Agraharam, Sairam ^a   Hess, Dennis W ^a   Kohl, Paul A ^a   Bidstrup Allen, Sue A ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033471487     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582053     Document Type: Article

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