Structure and electrical studies of fluorinated amorphous carbon films prepared by electron cyclotron resonance/chemical-vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 A, 2003, Pages 3598-3602

  Huang, Kun Ping ^a   Lin, Pang ^a   Shih, Han C ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

A C:F; Bonding; Conductivity; Dielectric; ECR CVD; Films

Indexed keywords

ANNEALING; CARBON; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRON CYCLOTRON RESONANCE; ELECTRON ENERGY LOSS SPECTROSCOPY; FLUORINE; PERMITTIVITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

FLUORINATED AMORPHOUS CARBON FILM; HIGH DIELECTRIC STRENGTH; RADIO-FREQUENCY BIAS ASSISTED ELECTRON CYCLOTRON RESONANCE;

AMORPHOUS FILMS;

EID: 0042739626     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3598     Document Type: Article

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