Thermal stability of a-C:F,H films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

Materials Research Society Symposium - Proceedings

Volumn 476, Issue , 1997, Pages 31-36

  Theil, Jeremy A ^a   Mertz, Francoise ^a   Yairi, Micah ^a   Seaward, Karen ^a   Ray, Gary ^a   Kooi, Gerrit ^a  

^a HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; FLUOROCARBONS; INFRARED SPECTROSCOPY; PERMITTIVITY; PLASMA APPLICATIONS; THERMAL CYCLING; THERMAL EFFECTS; THERMODYNAMIC STABILITY;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

AMORPHOUS FILMS;

EID: 0031382597     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-476-31     Document Type: Conference Paper

References (15)