Characterization of hard amorphous carbon films deposited with high-energy ion beams

Applied Surface Science

Volumn 103, Issue 3, 1996, Pages 261-267

  Pregliasco, R G ^a   Zampieri, G ^a   Huck, H ^b   Halac, E B ^b   De Benyacar, M A R ^b   Righini, R ^c  

^a CENTRO ATÓMICO BARILOCHE   (Argentina)

^b DEPARTAMENTO DE FÍSICA   (Argentina)

^c DEPARTAMENTO DE CIENCIAS BÁSICAS   (Argentina)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON; ELECTRON ENERGY LOSS SPECTROSCOPY; ION BEAMS; ION BOMBARDMENT; RAMAN SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY;

FILMS MICROSCOPIC STRUCTURES; HIGH ENERGY ION BOMBARDMENT;

AMORPHOUS FILMS;

EID: 0030291139     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00475-8     Document Type: Article

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