Structural and mechanical characterization of fluorinated amorphous-carbon films deposited by plasma decomposition of CF4-CH4 gas mixtures

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2230-2238

  Jacobsohn, L G ^a   Franceschini, D F ^a   Maia Da Costa, M E H ^b   Freire Jr , F L ^b  

^a FLUMINENSE FEDERAL UNIVERSITY   (Brazil)

^b PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; INFRARED TRANSMISSION; ION BEAMS; METHANE; MIXTURES; PARTIAL PRESSURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; VICKERS HARDNESS TESTING;

CARBON TETRAFLUORIDE; ION-BEAM ANALYSIS (IBA);

FLUORINE CONTAINING POLYMERS;

EID: 0034272652     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1289540     Document Type: Article

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