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Volumn 37, Issue 4 SUPPL. A, 1998, Pages 1809-1814
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Application of fluorinated amorphous carbon thin films for low dielectric constant interlayer dielectrics
a a a a
a
NEC CORPORATION
(Japan)
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Author keywords
Amorphous; Carbon; Dielectric constant; Fluorine; Interlayer dielectrics; Plasma enhanced CVD
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Indexed keywords
ADHESION;
AMORPHOUS FILMS;
CHEMICAL POLISHING;
CHEMICAL VAPOR DEPOSITION;
FLUOROCARBONS;
METALLIZING;
PERMITTIVITY;
PLASMA APPLICATIONS;
SUBSTRATES;
THERMODYNAMIC STABILITY;
CHEMICAL MECHANICAL POLISHING (CMP);
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);
DIELECTRIC FILMS;
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EID: 0032049115
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.37.1809 Document Type: Article |
Times cited : (34)
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References (16)
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