Preparation of fluorinated amorphous carbon thin films

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 1, 1998, Pages 641-644

  Yokomichi, Haruo ^a   Hayashi, Tohru ^a   Amano, Tomihiro ^a   Masuda, Atsushi ^b  

^a TOYAMA PREFECTURAL UNIVERSITY   (Japan)

^b JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Dangling bond density; Fluorinated amorphous carbon thin films; Line width; Plasma chemical vapor deposition

Indexed keywords

CARBON; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; ELECTRON SPIN RESONANCE SPECTROSCOPY; FILM PREPARATION; FLUOROCARBONS; INFRARED SPECTROSCOPY; LIGHT ABSORPTION; METHANE; PERMITTIVITY MEASUREMENT; PLASMA APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

DANGLING BOND DENSITY; FLUORINATED AMORPHOUS CARBON THIN FILMS; PLASMA CHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 0032067246     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00234-8     Document Type: Article

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