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Volumn 72, Issue 11, 2005, Pages

Coupling atomistic and continuum length scales in heteroepitaxial systems: Multiscale molecular-dynamics/finite-element simulations of strain relaxation in Si Si3N4 nanopixels

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EID: 29744436107     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.72.115338     Document Type: Article
Times cited : (9)

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