A model of strain relaxation in hetero-epitaxial films on compliant substrates

Applied Physics A: Materials Science and Processing

Volumn 66, Issue 1, 1998, Pages 13-22

  Kastner G ^a   Gosele U ^a   Tan, T Y ^b  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b Duke University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL LATTICES; CRYSTALLOGRAPHY; DISLOCATIONS (CRYSTALS); PLASTIC DEFORMATION; RELAXATION PROCESSES; SUBSTRATES; THIN FILMS;

HETERO EPITAXIAL FILMS; PLASTICALLY COMPLIANT SUBSTRATE (PCS); STRAIN RELAXATION;

SEMICONDUCTING FILMS;

EID: 0031654189     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390050631     Document Type: Article

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