A method to interpret micro-Raman experiments made to measure nonuniform stresses: Application to local oxidation of silicon structures

Journal of Applied Physics

Volumn 84, Issue 5, 1998, Pages 2507-2512

  Pinardi, K ^a,b   Jain, S C ^a   Willander, M ^b   Atkinson, A ^c   Maes, H E ^a   Van Overstraeten, R ^a  

^a IMEC   (Belgium)

^b CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^c IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000377650     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368411     Document Type: Article

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