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Volumn 95, Issue 9, 2004, Pages 4635-4641

Evolution of surface roughness of AlN and GaN induced by inductively coupled Cl 2/Ar plasma etching

Author keywords

[No Author keywords available]

Indexed keywords

DESORPTION FLUX; HIGH-DENSITY PLASMA; KINETIC ROUGHENING; SURFACE DEPRESSIONS;

EID: 2442630497     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1688993     Document Type: Article
Times cited : (54)

References (51)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.